polish pavilion for shanghai expo in 2010

on december 11, 2007 the polish government chose a winner in the design competition for the polish pavilion at the 2010 world expo in shanghai. the winning entry was design by architects wojciech kakowski, marcin mostafa and natalia paszkowska. their building is inspired by traditional polish folk art paper cut-outs reinterpreted in a contemporary fashion. the idea was generated when the team sought to create a 'cultural ideogram' that would signify the country of origin in an iconic way. the project focuses on exploring the importance of the personal experience between buildings and people. the ramp that is created by the folded exterior enables visitors to climb onto the roof of the building, making the entire building a function exhibition space.